Semiconductor industry specific nitrogen generator(Chamber protection gas, dry pump blowing gas)

NITROGEN-M-100/200

Peculiar for LC/MS The special requirements for nitrogen flow rate, purity, and pressure have been specially designed to be safe, efficient, and convenient

PECULIAR(UK)INSTRUMENT TECHNOLOGY LIMITED Praller Technology Limited, UKLC/MS nitrogenGas generator, producing clean and dry nitrogen gas with a purity of up to 99.5%, suitable for semiconductor industry chamber protection gas and dry pump blowing gas

Requirement, including APCI and ESI interfaces. The nitrogen generator adopts membrane separation technology, which can continuously obtain clean and dry products without the need for secondary purification

Dry and phthalate free nitrogen gas with stable purity and flow rate, and long service life. External scroll compressor improves air supply

Safety, flow rate range from0-100L/min, Can supply nitrogen to one or more instruments simultaneously. Special models can be customized, the most

A large flow rate range can be achieved200 L/min。

Main technical parameters |

MAIN TECHNICAL PARAMETERS

◎ Flow rate: 0-100/200L/min @100psi(7bar)

◎ Working environment: 5C-40 ℃ humidity80%

◎ Maximum altitude used: 2200m

Dew point:<-55 ℃

◎ Particles:<0.01 μ m

◎ Retained liquid: None

◎ Phthalic acid: None

◎ Noise:<47dB (A)

◎ Power on purification time: 30 minutes

◎ Power: 8000W

◎ Power requirement: 220V 50Hz